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  • digital oscilloscope

    digital oscilloscope

    It is a 2-channel oscilloscope designed to support a wide range of monitoring and analysis activities. It has multiple functions, such as 34 automatic measurements, up to 200 MHz bandwidth, limit testing, data recording, dual channel frequency counter, waveform trend, and a sampling rate of up to 2 GS/s, making TBS1000B a leader among similar products

  • Modular super-resolution confocal microscopy system LiveCodim

    Modular super-resolution confocal microscopy system LiveCodim

    Traditional fluorescence microscopy is affected by the optical diffraction limit, with a high resolution of 200 nm, making it difficult to observe the ultrastructure in cells. LiveCodim is a modular super-resolution confocal microscopy system that can adapt to the vast majority of inverted fluorescence microscopes, upgrading existing inverted microscopes into imaging systems with three major modes

  • Laser heated base crystal growth furnace

    Laser heated base crystal growth furnace

    The laser heated pedestal crystal growth furnace (LHPG) produced by the company is a crucible free single crystal fiber growth process developed on the basis of the pull-up method crystal growth, using laser as the heat source. Due to its local melting characteristics, it can also be called floating zone melting crystal growth. Laser heated pedestal crystal growth (LHPG) has unique advantages suc

  • UHV PAN low-temperature scanning probe microscope

    UHV PAN low-temperature scanning probe microscope

    The main features of the Pan type low-temperature scanning probe microscopy analysis system include: -PAN STM/AFM scanning head volume (2.96 "X1.55") -Integrated large-scale movement of samples in the X-Y-Z direction (5mmX5mmX10mm) -The working temperature includes various ranges of low temperature 300mK, RT, VT, and HT -Built in spring and eddy current damping damping syst

  • Automatic phase transition point measurement system

    Automatic phase transition point measurement system

    The company's automatic phase change point measurement system can quickly heat and cool metal samples between room temperature and up to 1350 ℃. During the heating and cooling process, the phase change point is automatically obtained by measuring thermal expansion and contraction. At temperatures below 0 ℃, liquid nitrogen is used for cooling to obtain a mechanism from 0 ℃ to -150 ℃.

  • Solid-state semiconductor laser

    Solid-state semiconductor laser

    develops and produces DPSS (diode pumped solid-state lasers) and semiconductor lasers in the ultraviolet, visible, and near-infrared wavelength ranges. The LCX series DPSS laser and LBX series semiconductor laser provide excellent optical performance with their ultra compact design, which can be easily integrated into various instruments in the life sciences, measurement and other markets. Oxxius

  • High precision laser scanning microscope

    High precision laser scanning microscope

    The high-precision laser scanning microscope NESSIE is a derivative company of the University of Michigan in the United States that has been dedicated to its development. The innovative design makes it compact in appearance, flexible in components, and adaptable to sample stages of different heights, even low-temperature optical thermostats, achieving low-temperature microscopy imaging. Microscope

  • Terahertz near-field optical microscope THz NeaSNOM

    Terahertz near-field optical microscope THz NeaSNOM

    Terahertz (THz) light sources have a larger wavelength, typically around 300 microns. Due to the existence of diffraction limits, the optical spatial resolution of THz far-field measurement systems is generally limited to around 150 microns. The accuracy of THz far-field measurement results often fails to meet the needs of material science research, especially in experiments that require nanoscale

  • Desktop 3D Atomic Layer Deposition System ALD

    Desktop 3D Atomic Layer Deposition System ALD

    Atomic layer deposition (ALD) is a method of depositing substances layer by layer in the form of a single atomic film on the surface of a substrate by chemically adsorbing them onto the deposited substrate through alternating pulses of gas-phase precursors and reacting to form a deposition film. Therefore, it is a true "nano" technology that achieves the deposition of ultra-thin films at the nanos

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