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Atomic layer deposition (ALD) is a method of depositing substances layer by layer in the form of a single atomic film on the surface of a substrate by chemically adsorbing them onto the deposited substrate through alternating pulses of gas-phase precursors and reacting to form a deposition film. Therefore, it is a true "nano" technology that achieves the deposition of ultra-thin films at the nanos
We provide you with high-performance, easy to operate, easy to maintain, and low-cost desktop nuclear magnetic resonance spectrometers (NMR) for scientific research: EFT-60 (60MHz), EFT-90 (90MHz). EFT-60/90 is a liquid helium free NMR capable of scientific research, and its measurement data has been published multiple times in globally renowned chemical journals and journals, such as J
High temperature furnaces are suitable for various laboratory applications and small-scale production. Easy to operate and stable in performance. High customizable temperature up to 3000 ℃.
Moorfield Nanotechnology has been focusing on high-quality film growth and processing technology for 25 years, with strong technical strength. Its various high-performance equipment has been widely praised in scientific research and industrial fields. Moorfield has worked closely with the Nobel Prize technical team of the University of Manchester in the past ten years, and the tabletop high-precis
Ultra high vacuum temperature scanning probe microscope UHV STM/AFM system ● UHV STM/AFM subsystem Scanning probe microscopy surface analysis system Ultra high vacuum and low temperature four probe surface analysis system - UHV LT QuadraProbe Ultra high vacuum Beetle type variable temperature and magnetic field system - UHV VT VMF STM/AFM
After the successful launch of the revolutionary scanning probe microscope controller R9, its R&D team has grandly released a new generation R10 controller by upgrading its software, hardware, and functionality. Compared to the R9 controller, the performance improvement of the R10 controller mainly includes: >The new FPGA firmware architecture enhances configuration flexibility >More
A major scientific challenge in modern chemistry is how to achieve non-destructive chemical composition identification of materials at the nanoscale. Some existing high-resolution imaging technologies, such as electron microscopy or scanning probe microscopy, can partially solve this problem, but their inherent chemical sensitivity is too low to meet the requirements of modern chemical nanoanalysi
Atomic layer deposition (ALD) is a method of depositing substances layer by layer in the form of a single atomic film on the surface of a substrate by chemically adsorbing them onto the deposited substrate through alternating pulses of gas-phase precursors and reacting to form a deposition film. Therefore, it is a true "nano" technology that achieves the deposition of ultra-thin films at the nanos
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