3D nanostructure high-speed direct writing machine

3D nanostructure high-speed direct writing machine - NanoFrazor Explore
A Joint Graphical Process Plan for Combining Nanolithography and Microlithography
NanoFrazor lithography technology, derived from the thermal scanning probe lithography technology developed by IBM Research, rapidly and accurately controls the movement and temperature of nanoneedles, and utilizes the hot needle tip to achieve rapid and accurate engraving of thermosensitive resist etchants, providing many novel and unique possibilities for nanomanufacturing.
NanoFrazor Explore is equipped with advanced hardware and software to control the heated NanoFrazor cantilever beam in an excellent way for writing and imaging, achieving various high-precision patterning processes based on closed-loop lithography technology. In 2019, Explore added a laser direct writing module, effectively accelerating the processing speed of patterns with characteristic line widths at the micrometer or submicron level. It is also a joint graphic technology solution that combines nanolithography and micrometer lithography. Thus, in the patterned process targeting the same anti etching layer, a seamless connection between nano etching and micro etching has been achieved. Thus, different precision engraving techniques can be adopted based on different pattern feature line widths, balancing accuracy and speed.