Ultra high temperature and high-speed annealing furnace

Ultra high temperature and high-speed annealing furnace
The desktop ultra-high temperature and high-speed annealing furnace launched by Japan's Advance Riko company can heat 15mm x 15mm samples to 1800 ℃ in 10 seconds with high-power point focusing heating and ultra-high reflection efficiency, and can anneal SiC and other high melting point materials.
Application field
• Generation and activation of SiC oxide film;
Semiconductor development and research;
Heat treatment of glass substrates, ceramics, composite materials, etc;
• As a heat treatment furnace, heat treat high melting point materials;
Thermal shock testing of ceramic materials.
Product features
Can be heated to ultra-high temperature of 1800 ℃ within 10 seconds;
Can be directly water quenched after heating;
Infrared lamp heating provides clean heating to reduce the generation of dust and gases;
Compact desktop design
• Connect to the computer via USB and input temperature parameters;
During the heating process, display the temperature on the computer screen.
Basic parameters
Temperature range: Room temperature -1800 ℃
Sample size: W15mm x L15mm x T1mm
Sample holder: alumina or high-purity carbon
Heating atmosphere: various
Thermocouple: JIS B φ 0.3 (W-Re optional)