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  • Research type wafer inspection microscope

Research type wafer inspection microscope

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  • Research type wafer inspection microscope
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Research type wafer inspection microscope
1、 The characteristics and applications of the DMM-600C series research wafer inspection microscope:
The DMM-600 series research wafer inspection microscope (large platform wafer inspection microscope) is equipped with a large moving range stage, a falling beam illuminator, a flat field achromatic objective, a large field of view eyepiece, clear images, good contrast, and a polarizing device. It is an ideal instrument for research in metallurgy, mineralogy, precision engineering, electronics, and other fields. Suitable for use in schools, scientific research, factories, and other departments.
The DMM-600C research wafer inspection microscope (large platform wafer inspection microscope) is a high-tech product developed and successfully combined with optical microscopy technology, photoelectric conversion technology, and computer imaging technology. It can be used to manually observe metallographic images, as well as conveniently and timely observe metallographic images on a computer, which can be captured at any time for analysis and grading of metallographic spectra. High pixel metallographic photos can also be saved or printed.

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