High precision thin film preparation and processing system - MiniLab
Moorfield Nanotechnology has been dedicated to high-quality film growth and processing technology for over 20 years, with strong technical strength. Its various high-performance equipment has received widespread praise in scientific research and industrial fields. MiniLab, a high-precision film preparation and processing system, is the flagship series of products developed by Moorfield Nanotechnology in the UK after years of technical accumulation and improvement. The MiniLab series products are positioned as PVD systems with flexible configuration and modular design, which can be used for high-quality scientific research and pilot production.
MiniLab, a high-precision film preparation and processing system, has sold more than 200 sets since its launch. Its users include European universities and research institutes, such as Manchester University, Cambridge University, Imperial College of Technology, Northumbria University, Bath University, Exeter University, Queen Mary University in London, Huddersfield University, Leiden University, Essen University of Technology, the Spanish Institute of Photonics Science, the British National Physical Laboratory and other units are users and long-term partners of Moorfield Nanotechnology. Many users and collaborators have led to rapid development of product performance and design concepts, and entered the process of globalization.
MiniLab 026
The MiniLab 026 system is a small floor standing vacuum coating equipment with an easy to operate "flip over" vacuum chamber. Suitable for evaporation and sputtering deposition of metals, dielectrics, and organic compounds.
MiniLab 026 adopts an integrated design scheme, with a portion of the true cavity inserted downwards into the support frame. The chamber can be flipped or bell shaped. The system can be equipped with various deposition technologies, thermal evaporation and low-temperature evaporation sources (growing metals and organic matter), and magnetron sputtering sources (metal and inorganic). The sediment source is usually installed at the bottom of the chamber, and the sample is installed at the top, which can accommodate substrates with a diameter of up to 6 inches. Can provide substrate heating, rotation, and Z-shift. MiniLab 026 is also compatible with glove boxes and is a system in the MiniLab series that can be easily integrated with users' existing glove boxes.
Thin film growth methods available: thermal evaporation (metal), low-temperature thermal evaporation (organic matter), magnetron sputtering (metal, oxide, nitride, insulator)
MiniLab 060
The MiniLab 060 system is a popular universal platform in the MiniLab series, featuring a front open box chamber suitable for multi-source magnetron sputtering, as well as thermal evaporation and electron beam evaporation.
MiniLab 060 adopts an integrated design scheme, with the vacuum chamber installed on the control system electronic cabinet. The system can be equipped with various deposition technologies, including thermal evaporation and low-temperature evaporation sources (growing metals and organic matter), magnetron sputtering sources (metal and inorganic), and electron beam sources (most material categories except for organic matter). Sedimentary sources are usually installed at the bottom of the chamber, but sputtering sources can also be installed at the top. The sample stage can accommodate substrate sizes up to 11 inches, providing substrate heating, rotation, bias, and Z-shift. Can be configured with planetary sample stage, source baffle, and substrate baffle. The system configuration can range from manually operated thermal evaporation systems to various growth schemes with fully automatic process control. If necessary, the MiniLab 060 system can provide a fast injection chamber.
Thin film growth methods available: thermal evaporation (metal), low-temperature thermal evaporation (organic matter), electron beam evaporation, magnetron sputtering (metal, oxide, nitride, insulator)
MiniLab 080
MiniLab 080 adopts a high cavity design, which is very suitable for thermal evaporation, low-temperature thermal evaporation, and electron beam evaporation, with longer working distance to achieve excellent film uniformity.
The MiniLab 080 vacuum chamber is installed on the control system electronic cabinet. This system is very suitable for evaporation technologies that require longer working distances to achieve better uniformity. The evaporation incidence angle is close to 90 °, which achieves good lift off effect for photolithography devices. In addition to thermal evaporation, organic matter thermal evaporation, and electron beam evaporation, this system can also be used for magnetron sputtering (as a composite growth system).
The sample stage is usually located at the top of the chamber and can accommodate substrate sizes up to 11 inches in diameter. Can provide substrate heating, rotation, bias voltage, and Z-shift. Can be configured with planetary sample stage, source baffle, and substrate baffle. The system configuration can range from manually operated thermal evaporation systems to various growth schemes with fully automatic process control. If necessary, the MiniLab 080 system can provide a fast injection chamber.
Thin film growth methods available: thermal evaporation (metal), low-temperature thermal evaporation (organic matter), electron beam evaporation, magnetron sputtering (metal, oxide, nitride, insulator)
MiniLab 090
The MiniLab 090 system was developed for compatibility with glove boxes and is suitable for thin film growth that is sensitive to the atmosphere. The high chamber design scheme is an ideal choice for high-performance evaporation, and magnetron sputtering can also be used.
The MiniLab 090 system is a ground mounted PVD system used for metal, dielectric, and organic deposition. The system includes a box type stainless steel chamber, and the front and rear double door design can be integrated with the glove box, allowing operation of the system through the front door or external rear door in the glove box. The vacuum chamber has a large aspect ratio and is very suitable for high uniformity coatings over long working distances through evaporation technology, but the system can also be equipped with magnetron sputtering. The vacuum degree is better than 5 × 10-7mbar. We can provide very flexible configurations tailored to the budget and needs of our clients. The system configuration can range from manually operated thermal evaporation systems to various growth schemes with fully automatic process control.
Thin film growth methods available: thermal evaporation (metal), low-temperature thermal evaporation (organic matter), electron beam evaporation, magnetron sputtering (metal, oxide, nitride, insulator)
MiniLab 125
The MiniLab 125 system has brought the concept of modular design into the pilot scale. The large chamber allows for an increase in the size of components to meet the needs of large-area coating, and combined with a rapid injection chamber design scheme, it can improve the throughput of samples. Meanwhile, the system is fully customizable to match specific coating requirements.
The MiniLab 125 system is a floor standing vacuum coating equipment that can be used for metal, dielectric, and organic thin film deposition. The system includes a box type stainless steel chamber with a front door for collecting and placing samples. A large chamber volume can be used for pilot scale coatings or for complex configurations to meet flexible and versatile experimental needs. The system can install all major sedimentation components or customized components. The background vacuum of the system can reach 5 × 10-7mbar. Flexible configuration schemes can be adopted based on the user's budget and specific applications.
Thin film growth methods available: thermal evaporation (metal), low-temperature thermal evaporation (organic matter), electron beam evaporation, magnetron sputtering (metal, oxide, nitride, insulator)
