Arc plasma deposition system - APD

Arc plasma deposition system - APD
The company is committed to arc plasma deposition (APD) systems that use pulsed arc discharge to ionize conductive materials, generate high-energy ions, and deposit them on substrates to prepare nanoscale thin film coatings or nanoparticles.
The arc plasma deposition system can precisely control the diameter of nanoparticles in the range of 1.5nm to 6nm by controlling the pulse energy, with good activity and high yield. The simultaneous preparation of multiple target materials can generate new compounds. Metal/semiconductor fabrication can generate oxide and nitride thin films by simultaneously controlling the cavity atmosphere. High energy plasma can deposit carbon and related monomers such as amorphous carbon, nano diamonds, and carbon nanotubes to form new nano particle catalysts.

application area
1. Preparation of new metal compounds, or preparation of oxide and nitride films (in oxygen and nitrogen atmospheres);
2. Preparation of amorphous carbon, nanodiamonds, and carbon nanotube nanoparticles;
3. Forming new nano particle catalysts
(Waste gas catalyst, volatile organic compound decomposition catalyst, photocatalyst, fuel cell electrode catalyst, hydrogen production catalyst);
4. Preparation of thermoelectric effect thin films using thermoelectric material targets.